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I have done some work using FEM simulation and fabricate nano-structure using E-beam lithography.
I have done some work using FEM simulation different type of nanostructure and fabricate nano-structure using E-beam lithography. We have measured in the full optical response of the medium.
The finite element method (FEM), is a numerical method for solving problems of engineering and mathematical physics. Typical problem areas of interest include structural analysis, heat transfer, fluid flow, mass transport, and electromagnetic potential. The analytical solution of these problems generally require the solution to boundary value problems for partial differential equations. The finite element method formulation of the problem results in a system of algebraic equations.
Electron-beam lithography (often abbreviated as e-beam lithography, EBL) is the practice of scanning a focused beam of electrons to draw custom shapes on a surface covered with an electron-sensitive film called a resist (exposing). The electron beam changes the solubility of the resist, enabling selective removal of either the exposed or non-exposed regions of the resist by immersing it in a solvent (developing). The purpose, as with photolithography, is to create very small structures in the resist that can subsequently be transferred to the substrate material, often by etching.
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